Selection, Input and Proposal submission only available after login
Option 1, Select the preliminary candidate beamlines
Check the interested beamline (multiple choice), then Input the reason to select (the input is mandate, otherwise submission unavaliable)
Download the template. If you want to provide suggestions and opinions for the selected candidate. Click + to upload in every selected candidate.ID | Beamline | Reason to select | Expected application | Beamline features | X-ray Probes | Structural information available | Sample environment | Energy range | Energy resolution (ΔE/E) | (coherent) photon flux@sample | Beam size@sample |
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1 |
Pink beam Nano-Coherent Imaing Beamline
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Energy material,Quantum material, Complex fluid,Soft matter,Nanomaterial,Biomedical,Environment science | Pursue extreme sensitivity in X-ray nanoprobes | n-XRF,n-XRD, n-CDI,n-XPCS、nanoholotomography、ptychography | Provide information in structure, element mapping, phase structure and dynamics with resolution better than 5nm | cryostat cooling for sample protection, fluid jet system, laser pump | 8-40keV | 0.5-2% | 10^14~10^15 coherent ph/s | 5-100nm | |
2 |
High Energy X-ray Nano Coherent Imaging beamline
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Engineering material,Energy material,Culture heritage, Amorphous material, Nanotechnology, Biomedical and Environment science | High penetration and less radiation damage with high energy X-ray, Structual information obtained in nanoscale inside bulk materials, or radiation sensitive biomedical sample unstained and unsectioned with unprecedented resolution | Ptychography, Scattering Imaging, Scanning Compton Imaging, PDF、Fluorescence Mapping, XRD | Multiscale structural information in crystalline materials(like alloy, ceramic) esp. in crystalline and stress distribution. Unstained and unsectioned and undamaged cell imaging in <5nm resolution | in-situ thermal and mechanic loading, Automatic sample changer | 20-100keV | 10^-3-10^-4 | 10^11~10^12 coherent ph/s | <10-500nm | |
3 |
Fly-scan Nano Coherent Imaging
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Energy material, Quantum material, Microelectronics,Culture heritage, Catalysis, Magnetic material, Geology | Semiconductor in-situ and fast 3D imaging with mm-cm size flat sample. | fly-scan mode ptychography CT/ Laminography/XRF/XRD , SEM | CT resolution 5-10nm | Robotic Sample changer, Electrical field, High and low temperature condition | 5-30keV | 10^-4 | 10^13 coherent phs/s @12.4keV | 100nm-10μm | |
4 |
Surface Interface Nano Coherent Imaging Beamline
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Surface/interface material, Quantum material, Biomedical, Catalysis, Nanotechnology, Material synthesis, Crystal growth and film | Structure study on solid/liquid and liquid/liquid interface | Reflection Ptychography,GIXPCS, GISAXS | Nanostructure and dynamics in surface and interface. Reflection Ptychography: 3D structure in surface/interface, <10nm resolution in-plane and 1nm resolution out of plane. GIXPCS: Surface/Interface dynamics in ns-s time scale with μm-Å spatial scale. | Cryostat,in-situ atomsphere environment, in-situ growth, High and Low temperature condition, liquid surface chamber | 8~40keV | 10^-4 | 10^13phs/s Coherent photon flux @12.4keV | Reflection Ptychography:50nm(V)X5μm(H); GIXPCS:1-5μm (V) x 10-20μm (H) | |
5 |
Pink beam Coherent Imaging and Scattering Beamline
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Energy material, Biomedical, Soft matter | Pursue 1ps time resolution taking advantage of unprecedent pink beam intensity | XPCS,BCDI and Ptychography | XPCS: 1ps dynamics in 10-100nm spatial resolution; Ptychography: 3D imaging with <10nm resolution; BCDI: 3D strain imaging with 1-10nm resolution and strain sensitivity 10^-4 | in-situ cooling protection, sample injet, fly-scan | 10-40keV | 0.5-2% | 10^15 coherent ph/s | XPCS:1-10μm Ptychography/BCDI:50nm-1μm | |
6 |
Chemical Catalysis Nano-Coherent Imaging
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Catalysis and Chemical engineering, Nanotechnology, Energy material | High throughput atomis sturcture detection in nanoscale detection in nanocrystal catalyst,single atom catalyst and heterogenous phase catalyst | n-XAFS、n-XRF、n-XR for nanocrystal in matrix、BCDI and Bragg Ptychography | Atomis sturcture detection in nanoscale. BCDI/Bragg Ptychography: 3D strain imaging with 0.5-10nm resolution and strain sensitivity 10^-4 | High and Low temperature condition, electrical field, magnetic field, thermal and mechanic loading, redox atomsphere, in-situ gas/liquid/solid catalysis envrionment, Interface for Mass spectrum | 5-25keV | 10^-4 | 2-5×10^12 coherent ph/s | 20nm-1μm | |
7 |
High Energy-XPCS beamline
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Material synthesis, Crystal growth, Addititive manufacture, Corrosion process, Surface/Interface, Microelectronics, Quantum material, Soft matter | Structual dynamics study for bulk sample or under complex environment | XPCS,GIXPCS | Dynamics information: time scale 1000s-μs,spatial scale μm-Å. | In-situ cooling protection, in-situ crystal growth chamber, 3D printer, in-situ erosion condition, in-situ synthesis, film deposition, molecular beam epitaxy, Pulsed laser deposition | 15-60keV | 10^-4 | 10^12 ph/s coherent photon flux | 1-10μm | |
8 |
Multiscale diffraction imaging Beamline
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Engineering material, Polycrystalline material, Material Science | Mutliscale resolution in spatial and temporal scale by combinnig Diffraction Contrast Tomography(DCT), 3D-XRD, Dark-Field Imaging, Bragg CDI (BCDI) with spatial resolution from hundreds of mm to <10nm and temperal scale from s to ms | DCT、3D-XRD、Dark Field Imaging, BCDI/Bragg Ptychography | Mutlis-spatial and temporal scale and non-destructive 3D imaging for defects and strain distribution in diverse materials. BCDI/Bragg Ptychography provides 3D strain imaging of a single crystallineor adjacent crystallines in polycrystalline material to elucidate the influence of boundary and defects on material performance with <10nm resolution and 10^-4 strain sensitivity | in-situ thermal and mechanic loading, Robotic sample changer | 20-100keV | 10^-3-10^-4 | >10^11 coherentph/s @40keV | 0.1-10 mm BCDI:10-30 μm Bragg Ptychography:<1μm | |
9 |
High Energy Compton Scattering and Imaging Beamline
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Energy material, Catalysis and Chemical engineering, Non-destructive tesing for important component hard for penetration by geneal X-ray. | Atomic and electronic structure detection in deeply embedded sample (like redox ortibal imaging in momentum space for Li-ion battery), Non-destructive measurement for industrial metal component hard for penetration by general X-ray . | high resolution Compton scattering, Compton scattering Imaging, Magnetic Compton scattering | Atomic and electronic structure access in deeply embedded sample and non-destructive measurement for real industrial metal component hard for general X-ray penetration | in-situ/in-operando thermal and mechanic loading, High temperature environment, in-situ reaction cell | 100-800keV | 10^-3 and piink beam | 10^10;10^13ph/s (pink beam) polarization adjustable | 100 μm(focusing),10-20 mm(unfocusing) | |
10 |
X-ray Chemical imaging Beamline
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Catalysis, Energy material, Biomedical, geology and planetary, Environment, Paleontology, microelectronics | large field of view XANES CT and phase contrast CT using unfocused mode, simultaneous acquisition of SAXS CT and XRF CT using focusing mode, SAXS tensor CT can also be realized. | XANES tomography、SAXS tomography、SAXS tensor tomography、XRF tomography,Phase contrast CT | chemical valence state distribution, structure distribution, structural orentation and trace element distribution information in 2D and 3D with spatial resolution from sub-micron to micron. | gas-solid reaction system, liquid-solid reaction system, in situ electrochemical study system | 4.8-45keV | 10^-4 | 10^12-10^13 ph/s | 0.2-10 μm(focusing mode),10-20 mm(unfocusing mode) | |
11 |
Biomedical 3D imaging beamline
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3D non-destructive imaging for biomedical samples, Human Organ 3D Atlas | Model Organism and Human Organ 3D mesoscopic imaging Atlas | Multiscale and high sensitivity quantitative phase-contrast CT | sub mm resolution and high sensitivity multiscale biomedical 3D structure | Cryotat, Tissue fixiation, combined with fMRI | 20-70keV | pink beam ~10% | 10^13-10^14 phs/s | 1~10cm | |
12 |
Flat Samples 3D Nondestructive Imaging Beamline
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Engineering material, Microelectronics, Culture heritage,paleontology, etc | High sensitivity and non-destructive mesoscopic resolution 3D imaging for flat sample | phase-contrast limited angle CT, phase-contrast CT | High sensitivity and non-destructive mesoscopic resolution 3D imaging for flat sample like PCB, flat fossil, laminated material. | Robotic sample changer | 10-70keV | pink beam ~10% | 10^14 phs/s | 1mm-1cm | |
13 |
High-throughput XAFS Beamline
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Matrial science, Catalysis and Chemical engineering, Molecular environment study, etc | High throughput XAFS measure | XAFS,transimission or fluorescence | Local geometry and electronic structure | High/Low temperature in-situ chamber, interface for Mass spectrometer | 5-70keV | 10^-4 | 10^12 phs/s | 100μm(focusing) 1mm(unfocusing) | |
14 |
ED-XAFS
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Warm dense matter and plasma physics,Energy material, complex fluid, etc | sub-ns XAFS, irreversible process measure | time resolved ED-XAFS( XANES and EXAFS) | Trasient structual information by XAFS | laser shock wave instrumentation, In-situ reaction cell, laser pump, DAC/dDAC; | 5-75keV | polychromatic | 10^13 phs/s | 5-10μm | |
15 |
Environment Spectroscopy Beamline
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Molecular environment, Energy material, Biomedical | For the fields of environment, energy, biology, etc., with special attention to the distribution of environmental pollutants, the protection and research of human cultural heritage | Fluorescence Mapping/μ-XAFS,CDI | Submicron-resolved element 2D imaging and valence state 2D imaging | He/LN2 Cryostat、In-situ furnace R-T 1000°C、In situ reaction cell | 2.1-14keV | 10^-5-10^-4 | ~10^12 ph/s @2.5keV (0.2μm); ~10^13 ph/s @2.5keV(unfocusing) | 0.15 μm | |
16 |
High resolution powder diffraction Beamline
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Polycrystalline material, Environment, Geology/Planetary | High throughput and high resolution powder diffraction for phase tranistion, stress, defect study | high resolution powder diffraction | Structual information on phase structure,stress and strain, defects. | High and low temperature environment, magnetic field, in-situ reaction cell, in-situ Mass spectrum/chromatogrphy | 4.5-70keV | 10^-4 | 10^11-10^12phs/s | 100μm(foucsing),1mm(unfocusing) | |
17 |
High energy total scattering beamline
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Engineering material,Amorphous material, Nano material, Soft Matter | Dedicated to PDF and high Energy XRD | PDF、XRD | high temperature, in-situ thermal and mechanic loading | 30-120keV | 10^-3-10^-4 | 10^11-10^12 ph/s | 2-10 μm | ||
18 |
Large volume (multi-anvil cell) high-pressure (LVP) Beamline
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Synthesis and physical properites of new materials (e.g., superhard materials) under high pressure, explore on the components and properties of the matter inside the Earth and Planet | Diffraction and imaging measurements based on the large volume high pressure facility and synchrotron radiation X-ray; Synthesis of new materials, acoustic emission, ultrosonic interferometry, and electrical conductivity measurements for research withou X-rays. | XRD,radiography, tomography, acoustic emission, ultrasonic wave velocity, electrical conductivity measurement | Crystal structure, sample imaging | multi-anvil cell (6-8/6-6 mode), resistive heating | 15-70keV | 10^-3,white light | >10^12 phs/s | 10 μm | |
19 |
High-pressure (DAC) synergic method Beamline
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Research of crystallographic, electronic, magnetic structure and properties under extreme conditions for multidisciplinary matter, e.g., the Earth and Planet, Physics, Chemistry, Materials, etc. | Long/short range crystallgraphic and electronic strucutre measurements using synchrotron radiation X-ray high pressure DACs | XRD/XAFS/XES/x-ray Raman spectroscopy /imaging in DAC | Long-range crystal structure, local structure, charge transfer | DAC, dDAC, laser heating, resistive heating, cryogenic temperature | 4-25keV | 10^-4 | 10^11-10^12phs/s | 5~10 μm | |
20 |
Chemical crystallography Beamline
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Biomedical, Pharmaceutical, Nanotechnology | Small molecular crystallography, | single crystal diffraction, serial crystal diffraction | crystal stucture | in-situ crystal growth, crystal sample jet; | 10-70keV | 10^-4 | >10^12 phs/s | 5-10 μm | |
21 |
Laue crystallography
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Biomedical, Pharmaceutical, | Laue cryallography will capture the transient structure for macromolecular biology and small molecular chemical crystallography | Time-resolved Laue diffractoin and imaging, pump-and-probe,irreversible process,Laue diffraction,X-ray tomography; | time-resolved crystal structure information | laser pump, high and low temperature environment, DAC/dDAC,Sample jet | 15-120keV | white light | 10^14-10^15 phs/s | 5-10 μm | |
22 |
SAXS beamline for Industrial application
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Microelectronics, Catalysis, pharmaceutical, Nanotechnology | chip examination, micro-electronic | SAXS | nano-structure | Robotic sample changer | 8-30keV | 10^-4 | 10^12 phs/s | 100μm(matching with detector pixel size) | |
23 |
High energy SAXS beamline
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Amorphous material, Magnetic material, Engineering material | Nanoscale structure for thick sample and in-situ study | SAXS,WAXS | Nanoscale structure for thick sample and in-situ study | in-situ tensile environment , hign and low temperature envrionment | 20-50keV | 10^-4 | 10^11~10^12phs/s | 100μm(on detector) | |
24 |
Hard X-ray PES beamline
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Interface and Catalysis | electronic structure information in embedded interface | hard X-ray XPS hard X-ray PEEM Ambient pressure PES k-Microscopy | electronic structure information in embedded interface | in-situ sample processing | 2.4-30keV | 10^-4-10^-5 | 10^11-10^12 phs/s, polarization adjustbale | 5-20μm | |
25 |
High Energy Resolution IXS Beamline
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Water structure, Soft matter, Magnetic material, Amorphous material, condensed state physics | probing phonon dispersion in mm to sub-mm samples | High Energy Resolution IXS | phonon dispersion | high and low temperature, high pressure, magnetic field, strain device | 14-70keV | 10^-7 | >10^10 ph/s/meV | 5-10μm | |
26 |
Medium Energy Resolution RIXS Beamline
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Quantum material, Magnetic material, Energy Material, Condensed state physics | probing valence states in 4d, 5d transition metals | Medium Energy Resolution RIXS | valence state excitation, magnon, charge transfer | low temperature, high pressure, magnetic field, strain device | 2-15keV | 10^-5-10^-6 | >10^12ph/s | 5-10μm | |
27 |
Soft RIXS Beamline
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Quantum material, Magnetic material, Polycrystalline Material, Nanomaterial,Condensed state physics | Probing valence states in 3d transition metal elements, light elements like oxygen, nitrogen, etc. | soft RIXS | valence state excitation, magnon, electron-phonon coupling, charge transfer | Ultrahigh vacuum,low temperature, magnetic field, strain device | 0.25-1.6keV | 5000-100000(E/ΔE) | 10^11 -10^12ph/s | 5-10μm | |
28 |
HE-NRS Beamline
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Magnetic material, Geology/Planetary, Nuclear Physics, Energy Material, Condensed state physics, Precision measurement | nuclear resonant scattering of isotopes with high nuclear transition energy, e.g. 229Th (29keV) ,121Sb (37keV),161Ni (67keV),93Ir(73keV), 174Yb(76.465keV) | High energy nuclear resonance scattering (NRS) | nuclear hyperfine structure, high precision spectroscopy | low temperature, high magnetic field, high pressure | 20-100keV | 10^-13 (nuclear energy level)、10^-6-10^-7 | >10^10ph/s | 5-10μm (Focusing) ; ~1mm (unfocusing) | |
29 |
nano-NRS bemaline
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Magnetic material, Amorphous material, Geophysics/Planetary, High pressure study, Condensed state physics | nano focusing beam, nuclear resonant scattering of isotopes with low nuclear transition energy, e.g.57Fe, 121Eu, 119Sn, with a particular requirements for timing structure. bunch spacing >140ns for the first isotope and >50ns for the latter two | nano-NRS | phonon density of states, nuclear hyperfine structure at mesoscale | low temperature, high temperature high pressure, magnetic field, strain device | 7-30keV | 10^-9 (nuclear enegy level) 10^-6-10^-7 | >10^10ph/s | ~0.1 μm-10μm | |
30 |
Magnetic Material Beamline
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Magnetic material, Polycrystalline Material, Nanomaterial | XMCD、XMLD | XMCD、XMLD | local and electronic structure | Low temperature, High magnetic field, robotic sample changer | 8-30keV | 10^-4 | 10^12phs/s controllable polarization | 10~100μm | |
31 |
High Magnetic field Nano-Coherent Imaging
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Magnetic material, Polycrystalline Material, Nanomaterial | high magnetic field polarization microscopy | single crystal diffraction(k-spacemapping,with polarization analysis),BCDI、Bragg-Ptychography,XPCS | Dynamic atomic structure in nanoscale | Low temperature, High magnetic field | 5~25keV | 10^-4 | coherent photon flux 10^13ph/s polarization adjustbale | 10-500nm dependent on working distance required by strong magnetic field instrumentations | |
32 |
High-throughput Protein Crystallography beamline for drug screening
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Pharmaceutical, Biomedical | Pharmaceutical R&D | single crystal diffraction | single crystal structure | Robotic crystal changer, in-situ soaking system, automatic data collection | 8-30keV, optimized @12keV | 10^-3-10^-4 | 10^12ph/s | 5-10μm | |
33 |
ED-XRD for material genome
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Material Genome, phase diagram | High throughput XRD detection enabled by energy resolved area detector. Phase diagram of multi-component materials | ED-XRD | High throughput pahse determination and lattice constant measurement | Automatic sample changer, low and high temperature | 5-70keV | white light | 10^14-10^15 phs/s | >=10μm | |
34 |
Material Synergy Beamline
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Complex fluid,Catalysis and Chemical engineering, Nanotechnology | Combining multiple experimental techniques to in-situ track the real-time evolution of multiple-scale structures for dynamic process including chemical reaction, material synthesis and so on。 | Joint measurement of XRD+SAXS+WAXS | Hierarchical and multi-scale structure information including: local atomic structure of angstrom scale, mesoscopic structure of nanometer scale, and long-range ordered structure of micron scale. | Controllable temperature, pressure, flow, electric field, shear rate, etc; A variety of in-situ reaction cell; Auxiliary mass spectrometry, Chromatography, Infrared and Raman spectrometers. | 5-70keV | 10^-4 | 10^12-10^13 phs/s | 10μm | |
35 |
Energy materials and devices Multimodal Beamline
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Battery Devices,Energy Materials | in-situ structure characterization for battaery material | in-situ imaging+XRD+XES simultaneous measurement | Multiscale structure information under in-situ environment: local atomic structure, electronic structure, crystal structure, topography | High temperature, low temperature, in situ reaction cell, in situ chromatography/mass spectrometry | 4.5-70keV | 10^-4 | 10^11-10^12 phs/s | 5-10μm (focusing),1mm-1cm (un focusing) | |
36 |
Energy materials and devices multimodal spectroscopy beamline
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Battery Device,Energy Materials | Optimized for Li ion battery by combing X-ray Raman and XAFS | combing X-ray Raman and XAFS | Local atomic structure, electronic structure, charge transfer by micro-probes | High temperature, low temperature, in situ reaction cell, in situ mass spectrometry/chromatography | 4.5-25keV | 10^-4 | 10^12-10^13 ph/s | 0.1-2μm | |
37 |
Earth/planetary Science Beamline
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Earth/planetary Science, Environment, polycrystalline material | X-ray probes of micro-XAFS, micro-XRF mapping, phase-contrast CT, micro-XRD with online anaerobic environment | Micro-XAFS, Quantitative micro-XRF mapping, Phase-contrast CT, Micro-XRD | Quantitative element distribution, local atomic structure, valence state and phase strucutre by micro-probes | cryostat protection, online anaerobic environment | 8~70keV | 10^-4, pink beam | 10^13 ph/s(monochromatic),10^15 ph/s(pink beam) | < 1μm | |
38 |
Multispectral X-ray lithography
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X-ray lithography, LIGA, Microelectronics | Fabrication of nano/micro-devices for x-ray optics, like zone plate, grating and so on. The allowed line width and thickness cover a wide range. Exposure under tilting or rotating can be used for complex 3D structure fabrication. | Nano-lithography, Deep X-ray lithography, High energy X-ray lithography | 1)Nano-lithography:resolution better than 100 nm for a thickness of microns 2)Deep X-ray lithography:resolution around microns for a thickness below 1 mm 3)High energy X-ray lithography:for microstructures with a thickness over 1 mm | 50 kPa helium atomsphere, water cooling | Nano-lithography:1-3keV Deep X-ray lithography:3-12keV High energy X-ray lithography:>12keV | white light | >10^15 phs/s | 100mm in horizontal, total acceptance in vertical |
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